The semiconductor quartz crucible with high purity and high heat resistance is adopted

Short Description:

Quartz crucible with high purity and high heat resistance is an essential part in the drawing process of monocrystalline silicon. The performance of quartz crucible has a great impact on the crystallization rate of monocrystalline silicon, and Weitai Energy has been constantly innovating on how to improve the crystallization rate of customers, and has also made great breakthroughs. In order to meet the diverse production needs of different customers, our company has developed four series of quartz crucible to cope with different crystal pulling processes of customers. Quartz crucible sizes We currently cover from 14 “to 32″ and have the technical ability to customize larger sizes according to customer requirements.


Product Detail

Product Tags

d582f35ae24684e06ac1a35dca8df04

Quartz crucible is an essential component in the process of the mono-crystal silicon pulling whose performance has great influence on the crystallization rate. This is because when divirtrification occurred on the inner surface, the crystallography may fall off then adhere to the single silicon,thus to reduce the crystallization rate. AQMN's crucibles aren't easily to form devitrification and have the following 2 characteristics:

1. Less bubble in the transparent layer

2. Inner surface high purification

Quartz crucibles produced by our company, there are no bubbles in the transparent layer. The current main type all adopt special process technology, then make the series can restrain bubble expansion in the back-up layer and promote the service life under high temperature drastically.

 

Cross section before use

Cross section after use

第4页-41
第4页-40

1000um

1000um


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