CVD TaC Coating

Introduction to CVD TaC Coating:

CVD TaC Coating is a technology that uses chemical vapor deposition to deposit tantalum carbide (TaC) coating on the surface of a substrate. Tantalum carbide is a high-performance ceramic material with excellent mechanical and chemical properties. The CVD process generates a uniform TaC film on the surface of the substrate through gas reaction.

Main features:

Excellent hardness and wear resistance: Tantalum carbide has extremely high hardness, and CVD TaC Coating can significantly improve the wear resistance of the substrate. This makes the coating ideal for applications in high-wear environments, such as cutting tools and molds.

High Temperature Stability: TaC coatings protect critical furnace and reactor components at temperatures up to 2200°C, demonstrating good stability. It maintains chemical and mechanical stability under extreme temperature conditions, making it suitable for high-temperature processing and applications in high-temperature environments.

Excellent chemical stability: Tantalum carbide has strong corrosion resistance to most acids and alkalis, and CVD TaC Coating can effectively prevent damage to the substrate in corrosive environments.

High melting point: Tantalum carbide has a high melting point (approximately 3880°C), allowing CVD TaC Coating to be used in extreme high temperature conditions without melting or degrading.

Excellent thermal conductivity: TaC coating has high thermal conductivity, which helps to effectively dissipate heat in high-temperature processes and prevent local overheating.

Potential applications:

• Gallium Nitride (GaN) and Silicon Carbide epitaxial CVD reactor components including wafer carriers, satellite dishes, showerheads, ceilings, and susceptors

• Silicon carbide, gallium nitride and aluminum nitride (AlN) crystal growth components including crucibles, seed holders, guide rings and filters

• Industrial components including resistance heating elements, injection nozzles, masking rings and brazing jigs

Application features:

• Temperature stable above 2000°C, allowing operation at extreme temperatures
•Resistant to hydrogen (Hz), ammonia (NH3), monosilane (SiH4) and silicon (Si), providing protection in harsh chemical environments
• Its thermal shock resistance enables faster operating cycles
• Graphite has strong adhesion, ensuring a long service life and no coating delamination.
• Ultra-high purity to eliminate unnecessary impurities or contaminants
• Conformal coating coverage to tight dimensional tolerances

Technical specifications:

Preparation of dense tantalum carbide coatings by CVD：

TAC coating with high crystallinity and excellent uniformity：

CVD TAC COATING Technical Parameters_Semicera:

The above are typical values.