Silicon Carbide (SiC) Wafer Susceptors for MOCVD

Short Description:

Silicon Carbide (SiC) wafer susceptor is one of the key components used in the Metal Organic Chemical Vapor Deposition (MOCVD) process. Its main role is to monitor and control key parameters in the MOCVD process to ensure the growth quality and uniformity of the thin film.

 


Product Detail

Product Tags

Description

The Silicon Carbide (SiC) Wafer Susceptors for MOCVD from semicera are designed for advanced epitaxial processes, offering superior performance for both Si Epitaxy and SiC Epitaxy applications. Semicera's innovative approach ensures these susceptors are durable and efficient, providing stability and precision for critical manufacturing operations.

Engineered to support the intricate needs of MOCVD Susceptor systems, these products are versatile, compatible with carriers like PSS Etching Carrier, ICP Etching Carrier, and RTP Carrier. Their flexibility makes them suitable for high-tech industries, including those working with LED Epitaxial Susceptor and Monocrystalline Silicon.

With multiple configurations, including Barrel Susceptor and Pancake Susceptor, these wafer susceptors are also essential in the photovoltaic sector, supporting Photovoltaic Parts manufacturing. For semiconductor manufacturers, the capability to handle GaN on SiC Epitaxy processes makes these susceptors highly valuable for ensuring high-quality output across a wide range of applications.

 

Main Features

1 .High purity SiC coated graphite

2. Superior heat resistance & thermal uniformity

3. Fine SiC crystal coated for a smooth surface

4. High durability against chemical cleaning

 

Main Specifications of CVD-SIC Coatings:

SiC-CVD
Density (g/cc) 3.21
Flexural strength (Mpa) 470
Thermal expansion (10-6/K) 4
Thermal conductivity (W/mK) 300

Packing and Shipping

Supply Ability:
10000 Piece/Pieces per Month
Packaging & Delivery:
Packing:Standard & Strong Packing
Poly bag + Box + Carton + Pallet
Port:
Ningbo/Shenzhen/Shanghai
Lead Time:

Quantity(Pieces)

1-1000

>1000

 Est. Time(days) 30 To be negotiated
Semicera Work place
Semicera work place 2
Equipment machine
CNN processing, chemical cleaning, CVD coating
Semicera Ware House
Our service

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