Silicon Carbide Coated Graphite Wafer Carriers

1. Outstanding Thermal Stability and Conductivity Our SiC-coated wafer carriers excel in maintaining stable and consistent temperatures, crucial for CVD processes. This ensures uniform heat distribution, leading to superior thin film and coating quality.

2. Precision Manufacturing Each wafer carrier is manufactured to exacting standards, ensuring uniform thickness and surface smoothness. This precision is vital for achieving consistent deposition rates and film properties across multiple wafers, enhancing overall manufacturing quality.

3. Impurity Barrier The SiC coating acts as an impermeable barrier, preventing the diffusion of impurities from the susceptor into the wafer. This minimizes contamination risks, which is critical for producing high-purity semiconductor devices.

4. Durability and Cost Efficiency The robust construction and SiC coating enhance the durability of the wafer carriers, reducing the frequency of susceptor replacements. This leads to lower maintenance costs and minimized downtime, increasing the efficiency of semiconductor manufacturing operations.

5. Customization Options Semicorex Wafer Carriers with SiC Coating can be customized to meet specific process requirements, including variations in size, shape, and coating thickness. This flexibility allows for the optimization of the susceptor to match the unique demands of different semiconductor fabrication processes. Customization options enable the development of susceptor designs tailored for specialized applications, such as high-volume manufacturing or research and development, ensuring optimal performance for specific use cases.