Solid SiC Focus Ring

Short Description:

Semicera’s SiC Etch Rings are designed for high-performance semiconductor etching applications with exceptional durability and precision. Made from high-purity silicon carbide (SiC), this etch ring excels in plasma etching, dry etching, and wafer etching processes. Semicera’s advanced manufacturing process ensures that this ring provides excellent wear resistance and thermal stability even in the most demanding environments. We look forward to being your long-term partner in China.

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Product Detail

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The Solid SiC Focus Ring from Semicera is a cutting-edge component designed to meet the demands of advanced semiconductor manufacturing. Made from high-purity Silicon Carbide (SiC), this focus ring is ideal for a wide range of applications in the semiconductor industry, especially in CVD SiC processes, plasma etching, and ICP RIE (Inductively Coupled Plasma Reactive Ion Etching). Known for its exceptional wear resistance, high thermal stability, and purity, it ensures long-lasting performance in high-stress environments.

In semiconductor wafer processing, Solid SiC Focus Rings are crucial in maintaining precise etching during dry etching and wafer etching applications. The SiC focus ring assists in focusing the plasma during processes such as plasma etching machine operations, making it indispensable for etching of silicon wafers. The solid SiC material offers unparalleled resistance to erosion, ensuring the longevity of your equipment and minimizing downtime, which is essential for maintaining high throughput in semiconductor fabrication.

The Solid SiC Focus Ring from Semicera is engineered to withstand extreme temperatures and aggressive chemicals commonly encountered in the semiconductor industry. It is specifically crafted for use in high-precision tasks such as CVD SiC coatings, where purity and durability are paramount. With excellent resistance to thermal shock, this product ensures consistent and stable performance under the harshest conditions, including exposure to high temperatures during wafer etching processes.

In semiconductor applications, where precision and reliability are key, the Solid SiC Focus Ring plays a pivotal role in enhancing the overall efficiency of etching processes. Its robust, high-performance design makes it the perfect choice for industries requiring high-purity components that perform under extreme conditions. Whether used in CVD SiC ring applications or as part of the plasma etching process, Semicera's Solid SiC Focus Ring helps optimize your equipment's performance, offering the longevity and reliability your production processes demand.

Key Features:

• Superior wear resistance and high thermal stability
  • High-purity Solid SiC material for extended lifespan
  • Ideal for plasma etching, ICP RIE, and dry etching applications
  • Perfect for wafer etching, especially in CVD SiC processes
  • Reliable performance in extreme environments and high temperatures
  • Ensures precision and efficiency in etching of silicon wafers

Applications:

• CVD SiC processes in semiconductor manufacturing
• Plasma etching and ICP RIE systems
• Dry etching and wafer etching processes
• Etching and deposition in plasma etching machines
• Precision components for wafer rings and CVD SiC rings