Description
MOCVD Substrate Heater, Heating Elements For MOCVD
Graphite heater:
The graphite heater components are used in the high temperature furnace with temperature reached 2200 degree at vacuum environment and 3000 degree in the deoxidized and inserted gas environment.
Main features of graphite heater
1. uniformity of heating structure.
2. good electrical conductivity and high electrical load.
3. corrosion resistance.
4. inoxidizability.
5. high chemical purity.
6. high mechanical strength.
The advantage is energy efficient, high value and low maintenance.
We can produce anti-oxidation and long life span graphite crucible, graphite mold and all parts of graphite heater.
Chemical Graphite
Advantage:High temperature resistance
Application:MOCVD/Vacuum furnace/Hot Zone
Bulk Density:1.68-1.91g/cm3
Flexural strength: 30-46Mpa
Resistivity:7-12μΩm
Main parameters of graphite heater
| Technical Specification | VET-M3 |
| Bulk Density (g/cm3) | ≥1.85 |
| Ash Content (PPM) | ≤500 |
| Shore Hardness | ≥45 |
| Specific Resistance (μ.Ω.m) | ≤12 |
| Flexural Strength (Mpa) | ≥40 |
| Compressive Strength (Mpa) | ≥70 |
| Max. Grain Size (μm) | ≤43 |
| Coefficient of Thermal Expansion Mm/°C | ≤4.4*10-6 |
Graphite heater for electric furnace has properties of heat resistance, oxidation resistance, good electrical conductivity and better mechanical intensity. We can machine various types of graphite heater according to customers' designs.
Company Profile
WeiTai Energy Technology Co., Ltd. is a leading supplier of advanced semiconductor ceramics and the only manufacturer in China that can simultaneously provide high-purity silicon carbide ceramic(especially the Recrystallized SiC) and CVD SiC coating. In addition, our company is also committed to ceramic fields such as alumina, aluminum nitride, zirconia, and silicon nitride, etc.
Our main products including: silicon carbide etching disc, silicon carbide boat tow, silicon carbide wafer boat(Photovoltaic&Semiconductor), silicon carbide furnace tube, silicon carbide cantilever paddle, silicon carbide chucks, silicon carbide beam, as well as the CVD SiC coating and TaC coating. The products mainly used in the semiconductor and photovoltaic industries, such as equipment for crystal growth, epitaxy, etching, packaging, coating and diffusion furnaces,etc.
Our company has the complete production equipment such as molding, sintering, processing , coating equipment, etc., which can complete all the necessary links of product production and have higher controllability of product quality; The optimal production plan can be selected according to the needs of the product, resulting in lower cost and providing customers with more competitive products; We can flexibly and efficiently schedule production based on order delivery requirements and in conjunction with online order management systems, providing customers with faster and more guaranteed delivery time.
