CVD Silicon Carbide(SiC) Etching Ring is a special component made of Silicon Carbide (SiC) using the Chemical Vapor Deposition (CVD) method. CVD Silicon Carbide(SiC) Etching Ring plays a key role in a variety of industrial applications, especially in processes involving material etching. Silicon Carbide is a unique and advanced ceramic material known for its outstanding properties, including high hardness, excellent thermal conductivity and resistance to harsh chemical environments.
The Chemical Vapor Deposition process involves depositing a thin layer of SiC onto a substrate in a controlled environment, resulting in a high-purity and precisely engineered material. CVD Silicon Carbide is known for its uniform and dense microstructure, excellent mechanical strength and enhanced thermal stability.
CVD Silicon Carbide(SiC) Etching Ring is made of CVD Silicon Carbide, which not only ensures excellent durability, but also resists chemical corrosion and extreme temperature changes. This makes it ideal for applications where precision, reliability and life are critical.
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Epitaxy Growth Susceptor
Silicon/silicon carbide wafers need to go through multiple processes to be used in electronic devices. An important process is silicon/sic epitaxy, in which silicon/sic wafers are carried on a graphite base. Special advantages of Semicera's silicon carbide-coated graphite base include extremely high purity, uniform coating, and extremely long service life. They also have high chemical resistance and thermal stability.
LED Chip Production
During the extensive coating of the MOCVD reactor, the planetary base or carrier moves the substrate wafer. The performance of the base material has a great influence on the coating quality, which in turn affects the scrap rate of the chip. Semicera's silicon carbide-coated base increases the manufacturing efficiency of high-quality LED wafers and minimizes wavelength deviation. We also supply additional graphite components for all MOCVD reactors currently in use. We can coat almost any component with a silicon carbide coating, even if the component diameter is up to 1.5M, we can still coat with silicon carbide.
Semiconductor Field, Oxidation Diffusion Process, Etc.
In the semiconductor process, the oxidation expansion process requires high product purity, and at Semicera we offer custom and CVD coating services for the majority of silicon carbide parts.
The following picture shows the rough-processed silicon carbide slurry of Semicea and the silicon carbide furnace tube that is cleaned in the 1000-level dust-free room. Our workers are working before coating. The purity of our silicon carbide can reach 99.99%, and the purity of sic coating is greater than 99.99995%
Raw Silicon Carbide Paddle and SiC Process Tube in Cleaing
Silicon Carbide Wafer Boat CVD SiC Coated
