CVD SiC Coating Epitaxial Deposition In Epitaxy Reactor System

Short Description:

Semicera offers a comprehensive range of susceptors and graphite components designed for various epitaxy reactors.

Through strategic partnerships with industry-leading OEMs, extensive materials expertise, and advanced manufacturing capabilities, Semicera delivers tailored designs to meet the specific requirements of your application. Our commitment to excellence ensures that you receive optimal solutions for your epitaxy reactor needs.

 

 


Product Detail

Product Tags

Our company provides SiC coating process services on the surface of graphite, ceramics and other materials by CVD method, so that special gases containing carbon and silicon can react at high temperature to obtain high-purity Sic molecules, which can be deposited on the surface of coated materials to form a SiC protective layer for barrel type hy pnotic.

 

Main features:

1 .High purity SiC coated graphite

2. Superior heat resistance & thermal uniformity

3. Fine SiC crystal coated for a smooth surface

4. High durability against chemical cleaning

 
CVD Epitaxial Deposition In Barrel Reactor

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure FCC β phase
Density g/cm ³ 3.21
Hardness Vickers hardness 2500
Grain Size μm 2~10
Chemical Purity % 99.99995
Heat Capacity J·kg-1 ·K-1 640
Sublimation Temperature 2700
Felexural Strength MPa  (RT 4-point) 415
Young’ s Modulus Gpa (4pt bend, 1300℃) 430
Thermal Expansion (C.T.E) 10-6K-1 4.5
Thermal conductivity (W/mK) 300

 

 
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Semicera work place 2
Equipment machine
CNN processing, chemical cleaning, CVD coating
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