6 Inch n-type sic substrate

Short Description:

6-inch n-type SiC substrate‌ is a semiconductor material characterized by the use of a 6-inch wafer size, which increases the number of devices that can be produced on a single wafer over a larger surface area, thereby reducing device-level costs. The development and application of 6-inch n-type SiC substrates benefited from the advancement of technologies such as the RAF growth method, which reduces dislocations by cutting crystals along dislocations and parallel directions and regrowing crystals, thereby improving the quality of the substrate. The application of this substrate is of great significance to improving the production efficiency and reducing costs of SiC power devices.

 


Product Detail

Product Tags

Silicon carbide (SiC) single crystal material has a large band gap width (~Si 3 times), high thermal conductivity (~Si 3.3 times or GaAs 10 times), high electron saturation migration rate (~Si 2.5 times), high breakdown electric field (~Si 10 times or GaAs 5 times) and other outstanding characteristics.

The third generation semiconductor materials mainly include SiC, GaN, diamond, etc., because its band gap width (Eg) is greater than or equal to 2.3 electron volts (eV), also known as wide band gap semiconductor materials. Compared with the first and second generation semiconductor materials, the third generation semiconductor materials have the advantages of high thermal conductivity, high breakdown electric field, high saturated electron migration rate and high bonding energy, which can meet the new requirements of modern electronic technology for high temperature, high power, high pressure, high frequency and radiation resistance and other harsh conditions. It has important application prospects in the fields of national defense, aviation, aerospace, oil exploration, optical storage, etc., and can reduce energy loss by more than 50% in many strategic industries such as broadband communications, solar energy, automobile manufacturing, semiconductor lighting, and smart grid, and can reduce equipment volume by more than 75%, which is of milestone significance for the development of human science and technology.

Semicera energy can provide customers with high-quality Conductive (Conductive), Semi-insulating (Semi-insulating), HPSI (High Purity semi-insulating) silicon carbide substrate; In addition, we can provide customers with homogeneous and heterogeneous silicon carbide epitaxial sheets; We can also customize the epitaxial sheet according to the specific needs of customers, and there is no minimum order quantity.

BASIC PRODUCT SPECIFICATIONS

Size

 6-inch
Diameter 150.0mm+0mm/-0.2mm
Surface Orientation off-axis:4°toward<1120>±0.5°
Primary Flat Length 47.5mm1.5 mm
Primary Flat Orientation <1120>±1.0°
Secondary Flat None
Thickness 350.0um±25.0um
Polytype 4H
Conductive Type n-type

CRYSTAL QUALITY SPECIFICATIONS

6-inch
Item P-MOS Grade P-SBD Grade
Resistivity 0.015Ω·cm-0.025Ω·cm
Polytype None permitted
Micropipe Density ≤0.2/cm2 ≤0.5/cm2
EPD ≤4000/cm2 ≤8000/cm2
TED ≤3000/cm2 ≤6000/cm2
BPD ≤1000/cm2 ≤2000/cm2
TSD ≤300/cm2 ≤1000/cm2
SF(Measured byUV-PL-355nm) ≤0.5% area ≤1% area
Hex plates by high intensity light None permitted
Visual CarbonInclusions by high intensity light Cumulativearea≤0.05%
微信截图_20240822105943

Resistivity

Polytype

6 lnch n-type sic substrate (3)
6 lnch n-type sic substrate (4)

BPD&TSD

6 lnch n-type sic substrate (5)
SiC wafers

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